Blank Cover Image

Qualification of alternating PSM: defect inspection analysis in comparison to wafer printing results

Author(s):
Dettmann, W. ( Infineon Technologies AG (Germany) )
Heumann, J.P. ( Infineon Technologies AG (Germany) )
Hagner, T. ( Infineon Technologies AG (Germany) )
Koehle, R. ( Infineon Technologies AG (Germany) )
Rahn, S. ( Infineon Technologies AG (Germany) )
Verbeek, M. ( Infineon Technologies AG (Germany) )
Zarrabian, M. ( Infineon Technologies AG (Germany) )
Weckesser, J. ( Infineon Technologies AG (Germany) )
Hennig, M. ( Infineon Technologies AG (Germany) )
Morgana, N. ( Infineon Technologies AG (Germany) )
5 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5130
Pub. Year:
2003
Page(from):
415
Page(to):
422
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819449962 [0819449962]
Language:
English
Call no.:
P63600/5130
Type:
Conference Proceedings

Similar Items:

Griesinger, U.A., Dettmann, W., Hennig, M., Heumann, J.P., Koehle, R., Ludwig, R., Verbeek, M., Zarrabian, M.

SPIE-The International Society for Optical Engineering

Pforr, R., Dettmann, W., Eisenhut, M., Hennig, M., Hofmann, D., Thiele, J., Thielscher, G.

SPIE - The International Society of Optical Engineering

Pforr, R., Ahrens, M., Dettmann, W., Hennig, M., Koehle, R., Ludwig, B., Morgana, N., Thiele, J.

SPIE-The International Society for Optical Engineering

Zurbrick,L., Heumann,J.P., Rudzinski,M.W., Stokowski,S.E., Urbach,J.-P., Wang,L.

SPIE-The International Society for Optical Engineering

Heumann, J.P., Zarrabian, M., Hennig, M., Dettmann, W., Zurbrick, L.S., Lang, M.

SPIE-The International Society for Optical Engineering

J. Heumann, J. Schramm, A. Birnstein, K.T. Park, T. Witte, N. Morgana, M. Hennig, R. Pforr, J. Thiele, N. Schmidt, C. …

SPIE - The International Society of Optical Engineering

Heumann, J.P., Schurack, F., Dettmann, W., Zurbrick, L., Lang, M.

SPIE - The International Society of Optical Engineering

Dettmann,W., Haffner,H., Heumann,J.P., Liebe,R., Ludwig,R., Moses,R.

SPIE-The International Society for Optical Engineering

Pforr, R., Hennig, M., Koehle, R., Morgana, N., Thiele, J., Weckesser, J.

SPIE - The International Society of Optical Engineering

Zurbrick, L.S., Heumann, J.P., Rudzinski, M.W., Stokowski, S.E., Urbach, J.-P, Wang, L.

SPIE-The International Society for Optical Engineering

Koehle, R., Dettmann, W., Verbeek, M.

SPIE-The International Society for Optical Engineering

Thiele, J., Ahrens, M., Dettmann, W., Heissmeier, M., Hennig, M., Ludwig, B., Moukara, M., Pforr, R.

SPIE-The International Society for Optical Engineering

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12