Qualification of alternating PSM: defect inspection analysis in comparison to wafer printing results
- Author(s):
Dettmann, W. ( Infineon Technologies AG (Germany) ) Heumann, J.P. ( Infineon Technologies AG (Germany) ) Hagner, T. ( Infineon Technologies AG (Germany) ) Koehle, R. ( Infineon Technologies AG (Germany) ) Rahn, S. ( Infineon Technologies AG (Germany) ) Verbeek, M. ( Infineon Technologies AG (Germany) ) Zarrabian, M. ( Infineon Technologies AG (Germany) ) Weckesser, J. ( Infineon Technologies AG (Germany) ) Hennig, M. ( Infineon Technologies AG (Germany) ) Morgana, N. ( Infineon Technologies AG (Germany) ) - Publication title:
- Photomask and Next-Generation Lithography Mask Technology X
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5130
- Pub. Year:
- 2003
- Page(from):
- 415
- Page(to):
- 422
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819449962 [0819449962]
- Language:
- English
- Call no.:
- P63600/5130
- Type:
- Conference Proceedings
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