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Inspection of aggressive OPC using aerial image-based mask inspection

Author(s):
Hsu, L.T.H. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Hung, J.C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Hsieh, H.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Rosenbusch, A. ( Etec Systems, Inc., an Applied Materials Co. (USA) )
Falah, R. ( Etec Systems, Inc., an Applied Materials Co. (Israel) )
Blumberg, Y. ( Etec Systems, Inc., an Applied Materials Co. (Israel) )
1 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5130
Pub. Year:
2003
Page(from):
357
Page(to):
363
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819449962 [0819449962]
Language:
English
Call no.:
P63600/5130
Type:
Conference Proceedings

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