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Arbitrary pattern fabrication with a LCD reticle-free exposure method

Author(s):
Morimoto, T. ( Kumamoto Technology and Industry Foundation (Japan) )
Nakamura, K. ( Kumamoto Technology and Industry Foundation (Japan) )
Kubota, H. ( Kumamoto Univ. (Japan) )
Nakada, A. ( Kumamoto Univ. (Japan) )
Akamichi, T. ( Kumamoto Univ. (Japan) )
Inokuchi, T. ( Sony Semiconductor Kyushu Corp. (Japan) )
Kosaka, K. ( Kumamoto Technology Inc. (Japan) )
2 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5130
Pub. Year:
2003
Page(from):
347
Page(to):
356
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819449962 [0819449962]
Language:
English
Call no.:
P63600/5130
Type:
Conference Proceedings

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