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Shot number analysis at 65-nm node mask writing using VSB writer

Author(s):
Hirumi, J. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Kuriyama, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Yoshioka, N. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Yoshikawa, R. ( NuFlare Technology Inc. (Japan) )
Hojo, Y. ( Hitachi High-Technologies Corp. (Japan) )
Matuzaka, T. ( Hitachi High-Technologies Corp. (Japan) )
Tanaka, K. ( JEOL Ltd. (Japan) )
Hoga, M. ( Dai Nippon Printing Co., Ltd. (Japan) )
3 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5130
Pub. Year:
2003
Page(from):
309
Page(to):
317
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819449962 [0819449962]
Language:
English
Call no.:
P63600/5130
Type:
Conference Proceedings

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