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Evalution of 193-nm alternating-aperture phase-shift mask dry etch processes

Author(s):
Plumhoff, J. ( Unaxis USA, Inc. (USA) )
Constantine, C. ( Unaxis USA, Inc. (USA) )
Shin, J. ( Unaxis USA, Inc. (USA) )
Reelfs, B. ( Unaxis USA, Inc. (USA) )
Rausa, E. ( Unaxis USA, Inc. (USA) )
Benz, J.M. ( IBM Microelectronics Div. (USA) )
Hibbs, M.S. ( IBM Microelectronics Div. (USA) )
Brunner, T.A. ( IBM Microelectronics Div. (USA) )
3 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5130
Pub. Year:
2003
Page(from):
253
Page(to):
263
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819449962 [0819449962]
Language:
English
Call no.:
P63600/5130
Type:
Conference Proceedings

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