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Develpment of etch rate uniformity adjustment technology for photomask quartz etch in manufacturing the 100% attenuated PSM

Author(s):
  • Jang, I.-Y. ( Samsung Electronics Co., Ltd. (South Korea) )
  • Lee, J.-Y. ( Samsung Electronics Co., Ltd. (South Korea) )
  • Kim, Y.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
  • Choi, S.-W. ( Samsung Electronics Co., Ltd. (South Korea) )
  • Sohn, J.-M. ( Samsung Electronics Co., Ltd. (South Korea) )
Publication title:
Photomask and Next-Generation Lithography Mask Technology X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5130
Pub. Year:
2003
Page(from):
246
Page(to):
252
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819449962 [0819449962]
Language:
English
Call no.:
P63600/5130
Type:
Conference Proceedings

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