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Photomask defect tracing, analysis, and reduction with chemically amplified resist process

Author(s):
Lin, C.-. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lai, R. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Huang, W.H. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Wang, B.C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Chen, C.Y. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Kung, C.H. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Yoo, C.-S. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Chen, J.-J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lee, S.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
4 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5130
Pub. Year:
2003
Page(from):
205
Page(to):
212
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819449962 [0819449962]
Language:
English
Call no.:
P63600/5130
Type:
Conference Proceedings

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