The feasibility study of thin Cr film for low process bias

The feasibility study of thin Cr film for low process bias

Author(s):

Seo, W.-W. ( Photronics-PKL (South Korea) )

Yoon, S.-Y. ( Photronics-PKL (South Korea) )

Park, D.-I. ( Photronics-PKL (South Korea) )

Park, E.-S. ( Photronics-PKL (South Korea) )

Kim, J.-M. ( Photronics-PKL (South Korea) )

Jeong, S.-M. ( Photronics-PKL (South Korea) )

Choi, S.-S. ( Photronics-PKL (South Korea) )

Cha, H.-S. ( S&S Tech. (South Korea) )

Nam, K.S. ( S&S Tech. (South Korea) )

4 more

Publication title:

Photomask and Next-Generation Lithography Mask Technology X

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5130

Pub. Year:

2003

Page(from):

136

Page(to):

143

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819449962 [0819449962]

Language:

English

Call no.:

P63600/5130

Type:

Conference Proceedings

Details

TDL ID:	ZA00013118
Series ID:	PA00000029
Conf. info. (Name):	Photomask and next-generation lithography mask technology
Conf. info. (Number):	2003 : 10th
Conf. info. (Venue):	Yokohama, Japan
Conf. info. (Date):	2003.04.16-2003.04.18

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