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Mask cost and cycle time reduction (Invited Paper)

Author(s):
Hsieh, H.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd (Taiwan) )
Hung, J.C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Chin, A.S.J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lee, S.C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Shin, J.J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Liu, R.G. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lin, B.J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
2 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5130
Pub. date:
2003
Page(from):
4
Page(to):
15
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819449962 [0819449962]
Language:
English
Call no.:
P63600/5130
Type:
Conference Proceedings

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