MEMS mirror array for a wavelength-selective 1xK switch (Invited Paper)
- Author(s):
Lopez, D.O. ( Lucent Technologies/Bell Labs. (USA) ) Pardo, F. ( Lucent Technologies/Bell Labs. (USA) ) Aksyuk, V.A. ( Lucent Technologies/Bell Labs. (USA) ) Simon, M.E. ( Lucent Technologies/Bell Labs. (USA) ) Shea, H.R. ( Lucent Technologies/Bell Labs. (USA) ) Marom, D.M. ( Lucent Technologies/Bell Labs. (USA) ) Neilson, D.T. ( Lucent Technologies/Bell Labs. (USA) ) Cirelli, R.A. ( Lucent Technologies/Bell Labs. (USA) ) Klemens, F.P. ( New Jersey Nanotechnology Consortium (USA) ) Mansfield, W.M. ( Lucent Technologies/Bell Labs. (USA) ) Fetter, L.A. ( New Jersey Nanotechnology Consortium (USA) ) Bower, E. ( Lucent Technologies/Bell Labs. (USA) ) Miner, J.F. ( Lucent Technologies/Bell Labs. (USA) ) Sorsch, T.W. ( Lucent Technologies/Bell Labs. (USA) ) - Publication title:
- Smart Sensors, Actuators, and MEMS
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5116
- Pub. Year:
- 2003
- Vol.:
- 2
- Pt.:
- Session 8
- Page(from):
- 445
- Page(to):
- 455
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819449764 [0819449768]
- Language:
- English
- Call no.:
- P63600/5116
- Type:
- Conference Proceedings
Similar Items:
Electrochemical Society |
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Two-dimensional MEMS array for maskless lithography and wavefront modulation
SPIE - The International Society of Optical Engineering |
8
Conference Proceedings
Sub-0.1-µm NMOS transistors fabricated using point-source x-ray lithography
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
Electrochemical Society |
4
Conference Proceedings
INVITED: 50 nm VERTICAL REPLACEMENT-GATE (VRG) nMOSFETS WITH ALD HfO2 GATE DIELECTRICS
Electrochemical Society |
SPIE - The International Society for Optical Engineering |
5
Conference Proceedings
INVITED: 50 nm VERTICAL REPLACEMENT-GATE (VRG) nMOSFETS WITH ALD HfO2 GATE DIELECTRICS
Electrochemical Society |
11
Conference Proceedings
Toward the ultimate storage device: the fabrication of an ultrahigh-density memory device with 193-nm lithography
SPIE - The International Society of Optical Engineering |
6
Conference Proceedings
Electrical and environmental reliability characterization of surface-micromachined MEMS polysilicon test structures
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
The Application of Solid Source Diffusion in the Vertical Replacement-Gate (VRG) MOSFET
Materials Research Society |