Computationally efficient modeling of wafer temperatures in an LPCVD furnace

Computationally efficient modeling of wafer temperatures in an LPCVD furnace

Author(s):

He, Q. ( Univ. of Texas at Austin (USA) )
Qin, S.J. ( Univ. of Texas at Austin (USA) )
Toprac, A.J. ( Yield Dynamics, Inc. (USA) )

Publication title:

Advanced process control and automation : 27 February, 2003, Santa Clara, California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5044

Pub. Year:

2003

Page(from):

97

Page(to):

108

Pages:

12

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448491 [0819448494]

Language:

English

Call no.:

P63600/5044

Type:

Conference Proceedings

Details

TDL ID:	ZA00013035
Series ID:	PA00000029
Conf. info. (Name):	Microelectronic Manufacturing : Advanced process control and automation
Conf. info. (Number):	2003
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2003.03.27

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