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Process, design, and optical proximity correction requirements for the 65-nm device generation

Author(s):
Lucas, K. ( Motorola, Inc. (USA) )
Montgomery, P. ( IMEC (Belgium) )
Litt, L.C. ( Motorola, Inc. (USA) )
Conley, W.
Postnikov, S.V.
Wu, W.
Yuan, C.-M.
Olivares, M.
Strozewski, K.
Carter, R.L.
Vasek, J.
Smith, D.
Fanucchi, E.L.
Wiaux, V. ( IMEC (Belgium) )
Vandenberghe, G.
Toublan, O. ( Mentor Graphics Corp. (France) )
Verhappen, A. ( ASML (Netherlands) )
Kuijten, J.P.
van Wingerden, J. ( Philips Research Labs. (Belgium) )
Kasprowicz, B.S. ( Photronics Inc. (USA) )
Tracy, J.W.
Progler, C.J.
Shiro, E. ( Motorola, Inc. (Russia) )
Topouzov, I.
Wimmer, K. ( Motorola (France) )
Roman, B.J. ( Motorola, Inc. (USA) )
21 more
Publication title:
Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5042
Pub. Year:
2003
Page(from):
353
Page(to):
364
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448477 [0819448478]
Language:
English
Call no.:
P63600/5042
Type:
Conference Proceedings

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