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Applications of image diagnostics to metrology quality assurance and process control

Author(s):
Allgair, J.A. ( Motorola, Inc. (USA) )
Boksha, V.V. ( Boksha Global Partners LP (USA) )
Bunday, B.D. ( International SEMATECH (USA) )
Diebold, A.C. ( International SEMATECH (USA) )
Cole, D.C. ( Boston Univ. (USA) )
Davidson, M.P. ( Spectel Research Corp. (USA) )
Hutcheson, J.D. ( VLSI Research, Inc. (USA) )
Gurnell, A.W. ( M2C Services (United Kingdom) )
Joy, D.C. ( Univ. of Tennessee/Knoxville (USA) )
McIntosh, J.M.
Muckenhirn, S.G.
Pellegrini, J.C. ( New Vision Systems (USA) )
Larrabee, R.D. ( National Institute of Standards and Technology (USA) )
Potzick, J.E.
Vlada, A.E.
Smith, N.P. ( Accent Optical Technologies (United Kingdom) )
Starikov, A. ( Intel Corp. (USA) )
Sulivan, N.T. ( Schlumberger Technologies, Inc. (USA) )
Wells, O.C. ( IBM Corp. (USA) )
14 more
Publication title:
Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5042
Pub. date:
2003
Page(from):
251
Page(to):
277
Pages:
27
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448477 [0819448478]
Language:
English
Call no.:
P63600/5042
Type:
Conference Proceedings

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