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Design-to-process integration: optimizing 130-nm X architecture manufacturing

Author(s):
Dean, R. ( Cadence Design Systems, Inc. (USA) )
Malhotra, V.K. ( Numerical Technologies, Inc. (USA) )
King, N. ( Numerical Technologies, Inc. (USA) )
Sanie, M. ( Numerical Technologies, Inc. (USA) )
MacDonald, S.S. ( DuPont Photomasks, Inc. (USA) )
Jordan, J.D. ( DuPont Photomasks, Inc. (USA) )
Hirukawa, S. ( Nikon Corp. (Japan) )
2 more
Publication title:
Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5042
Pub. Year:
2003
Page(from):
197
Page(to):
204
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448477 [0819448478]
Language:
English
Call no.:
P63600/5042
Type:
Conference Proceedings

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