OPC methods to improve image slope and process window

OPC methods to improve image slope and process window

Author(s):

Cobb, N.B. ( Mentor Graphics Corp. (USA) )
Granik, Y. ( Mentor Graphics Corp. (USA) )

Publication title:

Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5042

Pub. Year:

2003

Page(from):

116

Page(to):

125

Pages:

10

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448477 [0819448478]

Language:

English

Call no.:

P63600/5042

Type:

Conference Proceedings

Details

TDL ID:	ZA00013033
Series ID:	PA00000029
Conf. info. (Name):	Microelectronic Manufacturing : Design and process integration for microelectronic manufacturing
Conf. info. (Number):	2003 : 2nd
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2003.02.26-2003.02.28

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