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Layout optimization at the pinnacle of optical lithography (Invited Paper)

Author(s):
Liebmann, L.W. ( IBM Microelectronics Div. (USA) )
Northrop, G.A. ( IBM Corp. (USA) )
Culp, J. ( IBM Microelectronics Div. (USA) )
Sigal, L. ( IBM Corp. (USA) )
Barish, A. ( IBM Corp. (USA) )
Fonseca, C.A. ( IBM Microelectronics Div. (USA) )
1 more
Publication title:
Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5042
Pub. Year:
2003
Page(from):
1
Page(to):
14
Pages:
14
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448477 [0819448478]
Language:
English
Call no.:
P63600/5042
Type:
Conference Proceedings

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