CD-SEM measurement line edge roughness test patterns for 193 nm lithography

CD-SEM measurement line edge roughness test patterns for 193 nm lithography

Author(s):

Bunday, B.D. ( International SEMATECH (USA) )
Bishop, M. ( International SEMATECH (USA) )
Villarrubia, J.S. ( National Institute of Standards and Technology (USA) )
Vladar, A.E. ( National Institute of Standards and Technology (USA) )

Publication title:

Process and Materials Characterization and Diagnostics in IC Manufacturing

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5041

Pub. Year:

2003

Page(from):

127

Page(to):

141

Pages:

15

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448460 [081944846X]

Language:

English

Call no.:

P63600/5041

Type:

Conference Proceedings

Details

TDL ID:	ZA00013032
Series ID:	PA00000029
Conf. info. (Name):	Microelectronic Manufacturing : Process and Materials Characterization and Diagnostics in IC Manufacturing
Conf. info. (Number):	2003
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2003.02.27-2003.02.28

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