Sidewall structure estimation from CD-SEM for lithographic process control

Sidewall structure estimation from CD-SEM for lithographic process control

Author(s):

Bingham, P.R. ( Oak Ridge National Lab. (USA) )

Price, J.R. ( Oak Ridge National Lab. (USA) )

Tobin, K.W., Jr. ( Oak Ridge National Lab. (USA) )

Karnowski, T.P. ( Oak Ridge National Lab. (USA) )

Bennett, M.H. ( International SEMATECH (USA) )

Bogardus, E.H. ( International SEMATECH (USA) )

Bishop, M. ( International SEMATECH (USA) )

2 more

Publication title:

Process and Materials Characterization and Diagnostics in IC Manufacturing

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5041

Pub. Year:

2003

Page(from):

115

Page(to):

126

Pages:

12

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448460 [081944846X]

Language:

English

Call no.:

P63600/5041

Type:

Conference Proceedings

Details

TDL ID:	ZA00013032
Series ID:	PA00000029
Conf. info. (Name):	Microelectronic Manufacturing : Process and Materials Characterization and Diagnostics in IC Manufacturing
Conf. info. (Number):	2003
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2003.02.27-2003.02.28

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