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Outlier rejection with mixture models in alignment

Author(s):
Nakajima, S. ( Nikon Corp. (Japan) )
Kanaya, Y. ( Nikon Corp. (Japan) )
Li, M. ( Nikon Tech Corp. (Japan) )
Sugihara, T. ( Nikon Corp. (Japan) )
Sukegawa, A. ( Nikon Corp. (Japan) )
Magome, N. ( Nikon Corp. (Japan) )
1 more
Publication title:
Optical Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5040
Pub. date:
2003
Vol.:
Part Three
Page(from):
1729
Page(to):
1741
Pages:
13
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
Language:
English
Call no.:
P63600/5040
Type:
Conference Proceedings

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