Outlier rejection with mixture models in alignment

Outlier rejection with mixture models in alignment

Author(s):

Nakajima, S. ( Nikon Corp. (Japan) )

Kanaya, Y. ( Nikon Corp. (Japan) )

Li, M. ( Nikon Tech Corp. (Japan) )

Sugihara, T. ( Nikon Corp. (Japan) )

Sukegawa, A. ( Nikon Corp. (Japan) )

Magome, N. ( Nikon Corp. (Japan) )

1 more

Publication title:

Optical Microlithography XVI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5040

Pub. date:

2003

Vol.:

Part Three

Page(from):

1729

Page(to):

1741

Pages:

13

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448453 [0819448451]

Language:

English

Call no.:

P63600/5040

Type:

Conference Proceedings

Details

TDL ID:	ZA00013031
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2003 : 16th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2003.02.25-2003.02.28

Similar Items:

1 Conference Proceedings New method to reduce alignment error by optical system Nagayama, T., Nakajima, S., Sugaya, A., Kanaya, Y., Sukegawa, A. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Advanced alignment optical system for DUV scanner Nagayama, T., Yasuda, M., Kanaya, Y., Masada, T., Sugaya, A. SPIE - The International Society of Optical Engineering
2 Conference Proceedings Innovative optical alignment technique for CMP wafers Sugaya, A., Kanaya, Y., Nakajima, S., Nagayama, T., Shiraishi, N. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Double patterning requirements for optical lithography and prospects for optical extension without double patterning A. J. Hazelton, S. Wakamoto, S. Hirukawa, M. McCallum, N. Magome Society of Photo-optical Instrumentation Engineers
3 Conference Proceedings Development of customer assistance software for alignment parameter optimization Kanaya, Y., Nakajima, S. SPIE - The International Society of Optical Engineering	9 Conference Proceedings Improvement of alignment accuracy for scaled exposure field Nakajima,S., Tanigawa,M., Ishihama,A., Sakiyama,K. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Improving the measurement algorithm for alignment Nakajima,S., Kanaya,Y., Takahashi,A., Yoshida,K., Mizutani,H. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Fabrication of high-resolution gratings for polymeric optical waveguide devices Shibata, S., Sugihara, O., Kaino, T., Okamoto, N. SPIE - The International Society of Optical Engineering
5 Conference Proceedings Overlay improvement by using new framework of grid compensation for matching [6152-129] Sukegawa, A., Wakamoto, S., Nakajima, S., Kawakubo, M., Maome, N. SPIE - The International Society of Optical Engineering	11 Conference Proceedings Alignment in chromeless masks Mukherjee-Roy, M., Singh, N., Mehta, S.S., Suda, H., Kubota, T., Kimura, Y., Kinoshita, H. SPIE - The International Society of Optical Engineering
6 Conference Proceedings TTR (through the reticle) alignment system with photoresist ablation technique Tanaka, R., Kobayashi, M., Yasuda, M., Magome, N., Ishigo, K., Ikegami, H., Higashiki, T. SPIE - The International Society of Optical Engineering	12 Conference Proceedings Fabrication of Lotus-Type Porous Magnesium with Anisotropic Directional Pores by Mold Casting Technique K. Sugihara, S. Suzuki, H. Nakajima Trans Tech Publications

1

2

3

4

5

6

7

8

9

10

11

12