Ultra line-narrowed ArF excimer laser G42A for sub-90-nm lithography generation

Ultra line-narrowed ArF excimer laser G42A for sub-90-nm lithography generation

Author(s):

Saito, T. ( Gigaphoton Inc. (Japan) )

Suzuki, T. ( Gigaphoton Inc. (Japan) )

Yoshino, M. ( Gigaphoton Inc. (Japan) )

Wakabayashi, O. ( Komatsu Ltd. (Japan) )

Matsunaga, T. ( Gigaphoton Inc. (Japan) )

Fujimoto, J. ( Gigaphoton Inc. (Japan) )

Kakizaki, K. ( Gigaphoton Inc. (Japan) )

Yamazaki, T. ( Gigaphoton Inc. (Japan) )

Inoue, T. ( Gigaphoton Inc. (Japan) )

Terashima, K. ( Gigaphoton Inc. (Japan) )

Enami, T. ( Gigaphoton Inc. (Japan) )

Inoue, H. ( Gigaphoton Inc. (Japan) )

Sumitani, A. ( Komatsu Ltd. (Japan) )

Tomaru, H. ( Gigaphoton Inc. (Japan) )

Mizoguchi, H. ( Gigaphoton Inc. (Japan) )

10 more

Publication title:

Optical Microlithography XVI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5040

Pub. Year:

2003

Vol.:

Part Three

Page(from):

1704

Page(to):

1711

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448453 [0819448451]

Language:

English

Call no.:

P63600/5040

Type:

Conference Proceedings

Details

TDL ID:	ZA00013031
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2003 : 16th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2003.02.25-2003.02.28

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