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Excimer lasers for superhigh NA 193-nm lithography

Author(s):
Paetzel, R. ( Lambda Physik AG (Germany) )
Albrecht, H.S. ( Lambda Physik AG (Germany) )
Lokai, P. ( Lambda Physik AG (Germany) )
Zschocke, W. ( Lambda Physik AG (Germany) )
Schmidt, T. ( Lambda Physik AG (Germany) )
Bragin, I. ( Lambda Physik AG (Germany) )
Schroeder, T. ( Lambda Physik AG (Germany) )
Reusch, C. ( Lambda Physik AG (Germany) )
Spratte, S. ( Lambda Physik AG (Germany) )
4 more
Publication title:
Optical Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5040
Pub. Year:
2003
Vol.:
Part Three
Page(from):
1665
Page(to):
1671
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
Language:
English
Call no.:
P63600/5040
Type:
Conference Proceedings

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