Compaction and rarefaction of fused silica with 193-nm excimer laser exposure
- Author(s):
Algots, J.M. ( Cymer, Inc. (USA) ) Sandstrom, R. ( Cymer, Inc. (USA) ) Partlo, W.N. ( Cymer, Inc. (USA) ) Maroevic, P. ( Cymer, Inc. (USA) ) Eva, E. ( Carl Zeiss SMT AG (Germany) ) Gerhard, M. ( Carl Zeiss SMT AG (Germany) ) Linder, R. ( Carl Zeiss SMT AG (Germany) ) Stietz, F. ( Carl Zeiss SMT AG (Germany) ) - Publication title:
- Optical Microlithography XVI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5040
- Pub. Year:
- 2003
- Vol.:
- Part Three
- Page(from):
- 1639
- Page(to):
- 1650
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448453 [0819448451]
- Language:
- English
- Call no.:
- P63600/5040
- Type:
- Conference Proceedings
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