Image-blur tolerances for 65-nm and 45-nm node IC manufacturing

Image-blur tolerances for 65-nm and 45-nm node IC manufacturing

Author(s):

Lalovic, I. ( Advanced Micro Devices, Inc. (USA) )
Kroyan, A. ( Numerical Technologies, Inc. (USA) )
Kye, J. ( Advanced Micro Devices, Inc. (USA) )
Liu, H.-Y. ( Numerical Technologies, Inc. (USA) )
Levinson, H.J. ( Advanced Micro Devices, Inc. (USA) )

Publication title:

Optical Microlithography XVI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5040

Pub. Year:

2003

Vol.:

Part Three

Page(from):

1570

Page(to):

1580

Pages:

11

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448453 [0819448451]

Language:

English

Call no.:

P63600/5040

Type:

Conference Proceedings

Details

TDL ID:	ZA00013031
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2003 : 16th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2003.02.25-2003.02.28

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