Blank Cover Image

Impact of attenuated phase-shifting mask for 157-nm lithography with high numerical aperture lens

Author(s):
  • Watanabe, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
  • Kurose, E. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
  • Suganaga, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
  • Itani, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Publication title:
Optical Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5040
Pub. Year:
2003
Vol.:
Part Three
Page(from):
1378
Page(to):
1385
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
Language:
English
Call no.:
P63600/5040
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Control of side-lobe intensity for attenuated phase-shifting mask in 157-nm lithography

Watanabe, K., Kurose, E., Suganaga, T., Itani, T.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Wavefront aberration measurement in 157-nm high numerical aperture lens

Kim, J.-H., Suganaga, T., Watanabe, K., Kanda, N., Itani, T., Cashmore, J.S., Gower, M.C.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Optimization of the chromium-shielding attenuated phase shift mask for 157-nm lithography

Kurose, E., Watanabe, K., Suganaga, T., Itani, T., Fujii, K.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings 157-nm lithography for 65-nm node SRAM-gate

Suganaga, T., Irie, S., Miyoshi, S., Kim, J.-H., Watanabe, K., Kurose, E., Furukawa, T., Hagiwara, T., Ishimaru, T., …

SPIE-The International Society for Optical Engineering
3 Conference Proceedings 157-nm lithography with extremely high numerical aperture lens for 45-nm technology node

Suganaga, T., Lee, J.-W., Kurose, E., Ishimaru, T., Furukawa, T., Itani, T., Fujii, K., Cashmore, J.S., Gower, M.

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Materials for an attenuated phase-shifting mask in 157-nm lithography

Matsuo,T., Onodera,T., Itani,T., Morimoto,H., Haraguchi,T., Kanayama,K., Otaki,M.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings 157-nm chromeless phase lithography with extremely high numerical aperture

Watanabe, K., Hagiwara, T., Matsuura, S., Suganaga, T., Itani, T., Fujii, K.

SPIE - The International Society of Optical Engineering
10 Conference Proceedings 157-nm chromeless phase lithography for 45-nm SRAM gate

Suganaga, T., Watanabe, K., Matsuura, S., Hagiwara, T., Furukawa, T., Itani, T., Fujii, K.

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Sub-70-nm pattern fabrication using an alternating phase-shifting mask in 157-nm lithography

Irie, S., Kanda, N., Watanabe, K., Suganaga, T., Itani, T.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Investigation of attenuated phase-shifting mask material for 157-nm lithography

Onodera,T., Matsuo,T., Itani,T., Morimoto,H.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings 157-nm lithography with high numerical aperture lens for 70-nm technology node

Suganaga, T., Kanda, N., Kim, J.-H., Yamabe, O., Watanabe, K., Furukawa, T., Miyoshi, S., Itani, T., Cashmore, J.S., …

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Feasibility study of TaSiOx-type Att-PSM for 157-nm lithography

Watanabe, K., Yamabe, O., Kanda, N., Kim, J., Uchida, N., Irie, S., Suganaga, T., Itani, T.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12