Sub-100-nm DRAM cell patterning results and relation with lens aberration at 248-nm lithography era
- Author(s):
You, T.-J. ( Hynix Semiconductor Inc. (South Korea) ) Kim, H.S. ( Hynix Semiconductor Inc. (South Korea) ) Kim, J.-S. ( Hynix Semiconductor Inc. (South Korea) ) Kim, S.-K. ( Hynix Semiconductor Inc. (South Korea) ) Kim, Y.-D. ( Hynix Semiconductor Inc. (South Korea) ) Youn, H.S. ( Hynix Semiconductor Inc. (South Korea) ) Kong, K.-K. ( Hynix Semiconductor Inc. (South Korea) ) - Publication title:
- Optical Microlithography XVI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5040
- Pub. Year:
- 2003
- Vol.:
- Part Three
- Page(from):
- 1327
- Page(to):
- 1334
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448453 [0819448451]
- Language:
- English
- Call no.:
- P63600/5040
- Type:
- Conference Proceedings
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