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Sub-100-nm DRAM cell patterning results and relation with lens aberration at 248-nm lithography era

Author(s):
You, T.-J. ( Hynix Semiconductor Inc. (South Korea) )
Kim, H.S. ( Hynix Semiconductor Inc. (South Korea) )
Kim, J.-S. ( Hynix Semiconductor Inc. (South Korea) )
Kim, S.-K. ( Hynix Semiconductor Inc. (South Korea) )
Kim, Y.-D. ( Hynix Semiconductor Inc. (South Korea) )
Youn, H.S. ( Hynix Semiconductor Inc. (South Korea) )
Kong, K.-K. ( Hynix Semiconductor Inc. (South Korea) )
2 more
Publication title:
Optical Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5040
Pub. Year:
2003
Vol.:
Part Three
Page(from):
1327
Page(to):
1334
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
Language:
English
Call no.:
P63600/5040
Type:
Conference Proceedings

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