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Comparative study of chromeless and attenuated phase shift mask for 0.3-k1 ArF lithography of DRAM

Author(s):
Eom, T.-S. ( Hynix Semiconductor Inc. (South Korea) )
Lim, C.-M. ( Hynix Semiconductor Inc. (South Korea) )
Kim, S.-M. ( Hynix Semiconductor Inc. (South Korea) )
Kim, H.-B. ( Hynix Semiconductor Inc. (South Korea) )
Oh, S.-Y. ( Hynix Semiconductor Inc. (South Korea) )
Ma, W.-K. ( Hynix Semiconductor Inc. (South Korea) )
Moon, S.-C. ( Hynix Semiconductor Inc. (South Korea) )
Shin, K.S. ( Hynix Semiconductor Inc. (South Korea) )
3 more
Publication title:
Optical Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5040
Pub. date:
2003
Vol.:
Part Three
Page(from):
1310
Page(to):
1320
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
Language:
English
Call no.:
P63600/5040
Type:
Conference Proceedings

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