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Mighty high-T lithography for 65-nm generation contacts

Author(s):
Conley, W. ( Motorola, Inc. (USA) )
Montgomery, P.K. ( IMEC (Belgium) )
Lucas, K. ( Motorola, Inc. (USA) )
Litt, L.C. ( Motorola, Inc. (USA) )
Maltabes, J.G. ( Motorola, Inc. (USA) )
Dieu, L. ( DuPont Photomasks, Inc. (USA) )
Hughes, G.P. ( DuPont Photomasks, Inc. (USA) )
Mellenthin, D.L. ( DuPont Photomasks, Inc. (USA) )
Socha, R.J. ( ASML (USA) )
Fanucchi, E.L. ( Motorola, Inc. (USA) )
Verhappen, A. ( ASML (Netherlands) )
Wampler, K.E. ( ASML (USA) )
Yu, L. ( ASML (USA) )
Schaefer, E. ( ASML (USA) )
Cassel, S. ( ASML (USA) )
Kuijten, J.P. ( ASML (Netherlands) )
Pijnenburg, W. ( ASML (Netherlands) )
Wiaux, V. ( IMEC (Belgium) )
Vandenberghe, G. ( IMEC (Belgium) )
14 more
Publication title:
Optical Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5040
Pub. date:
2003
Vol.:
Part Two
Page(from):
1210
Page(to):
1219
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
Language:
English
Call no.:
P63600/5040
Type:
Conference Proceedings

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