Challenge for effective OCV control in 90-nm logic gate using ArF lithography

Challenge for effective OCV control in 90-nm logic gate using ArF lithography

Author(s):

Kang, H.-J. ( Samsung Electroincs Co., Ltd. (South Korea) )

Lee, S.-W. ( Samsung Electronics Co., Ltd. (South Korea) )

Lee, D.-Y. ( Samsung Electronics Co., Ltd. (South Korea) )

Yeo, G.-S. ( Samsung Electronics Co., Ltd. (South Korea) )

Lee, J.-H. ( Samsung Electronics Co., Ltd. (South Korea) )

Cho, H.-K. ( Samsung Electronics Co., Ltd. (South Korea) )

Han, W.-S. ( Samsung Electronics Co., Ltd. (South Korea) )

Moon, J.-T. ( Samsung Electronics Co., Ltd. (South Korea) )

3 more

Publication title:

Optical Microlithography XVI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5040

Pub. Year:

2003

Vol.:

Part Two

Page(from):

1194

Page(to):

1201

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448453 [0819448451]

Language:

English

Call no.:

P63600/5040

Type:

Conference Proceedings

Details

TDL ID:	ZA00013030
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2003 : 16th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2003.02.25-2003.02.28

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