Hybrid PPC methodology using multi-step correction and implementation for the sub-100-nm node

Hybrid PPC methodology using multi-step correction and implementation for the sub-100-nm node

Author(s):

Choi, S.-H. ( Samsung Electronics Co., Ltd. (South Korea) )

Park, J.-S. ( Samsung Electronics Co., Ltd. (South Korea) )

Park, C.-H. ( Samsung Electronics Co., Ltd. (South Korea) )

Chung, W.-Y. ( Samsung Electronics Co., Ltd. (South Korea) )

Kim, I.-S. ( Samsung Electronics Co., Ltd. (South Korea) )

Kim, D.-H. ( Samsung Electronics Co., Ltd. (South Korea) )

Kim, Y.-H. ( Samsung Electronics Co., Ltd. (South Korea) )

Yoo, M.-H. ( Samsung Electronics Co., Ltd. (South Korea) )

Kong, J.-T. ( Samsung Electronics Co., Ltd. (South Korea) )

4 more

Publication title:

Optical Microlithography XVI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5040

Pub. Year:

2003

Vol.:

Part Two

Page(from):

1176

Page(to):

1183

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448453 [0819448451]

Language:

English

Call no.:

P63600/5040

Type:

Conference Proceedings

Details

TDL ID:	ZA00013030
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2003 : 16th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2003.02.25-2003.02.28

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