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Feasibility evaluations of alternating phase-shift mask for imaging sub-80nm feature with KrF

Author(s):
  • Kang, M.-A. ( Samsung Electronics Co., Ltd. (South Korea) )
  • Kim, S.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
  • Shin, I.-K. ( Samsung Electronics Co., Ltd. (South Korea) )
  • Choi, S.-W. ( Samsung Electronics Co., Ltd. (South Korea) )
  • Sohn, J.-M. ( Samsung Electronics Co., Ltd. (South Korea) )
Publication title:
Optical Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5040
Pub. date:
2003
Vol.:
Part Two
Page(from):
1115
Page(to):
1124
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
Language:
English
Call no.:
P63600/5040
Type:
Conference Proceedings

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