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Extending ArF to the 65-nm node with full-phase lithography

Author(s):
Driessen, F.A. ( Numerical Technologies, Inc. (USA) )
Pierrat, C. ( Numerical Technologies, Inc. (USA) )
Vandenberghe, G. ( IMEC (Belgium) )
Ronse, K.G. ( IMEC (Belgium) )
Adrichem, P. ( Numerical Technologies, Inc. (USA) )
Liu, H.-Y. ( Numerical Technologies, Inc. (USA) )
1 more
Publication title:
Optical Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5040
Pub. date:
2003
Vol.:
Part Two
Page(from):
1091
Page(to):
1102
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
Language:
English
Call no.:
P63600/5040
Type:
Conference Proceedings

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