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Impact of mask defect in a high MEEF process

Author(s):
  • Jeong, C.-Y. ( Hynix Semiconductor Inc. (South Korea) )
  • Park, K.-Y. ( Hynix Semiconductor Inc. (South Korea) )
  • Choi, J.S. ( Hynix Semiconductor Inc. (South Korea) )
  • Lee, J.G. ( Hynix Semiconductor Inc. (South Korea) )
  • Lee, D.-H. ( Hynix Semiconductor Inc. (South Korea) )
Publication title:
Optical Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5040
Pub. Year:
2003
Vol.:
Part Two
Page(from):
1067
Page(to):
1078
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
Language:
English
Call no.:
P63600/5040
Type:
Conference Proceedings

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