Impact of mask defect in a high MEEF process
- Author(s):
- Jeong, C.-Y. ( Hynix Semiconductor Inc. (South Korea) )
- Park, K.-Y. ( Hynix Semiconductor Inc. (South Korea) )
- Choi, J.S. ( Hynix Semiconductor Inc. (South Korea) )
- Lee, J.G. ( Hynix Semiconductor Inc. (South Korea) )
- Lee, D.-H. ( Hynix Semiconductor Inc. (South Korea) )
- Publication title:
- Optical Microlithography XVI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5040
- Pub. Year:
- 2003
- Vol.:
- Part Two
- Page(from):
- 1067
- Page(to):
- 1078
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448453 [0819448451]
- Language:
- English
- Call no.:
- P63600/5040
- Type:
- Conference Proceedings
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