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Impact of scattering bars in damascene trench patterning

Author(s):
  • Mehta, S.S. ( Institute of Microelectronics (Singapore) )
  • Singh, N. ( Institute of Microelectronics (Singapore) )
  • Mukherjee-Roy, M. ( Institute of Microelectronics (Singapore) )
  • Kumar, R. ( Institute of Microelectronics (Singapore) )
Publication title:
Optical Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5040
Pub. Year:
2003
Vol.:
Part Two
Page(from):
967
Page(to):
971
Pages:
5
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
Language:
English
Call no.:
P63600/5040
Type:
Conference Proceedings

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