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Characterization and improvement of field CD uniformity for implementation of 0.15-μm technology device using KrF stepper

Author(s):
  • Hyun, Y.-S. ( Hynix Semiconductor, Inc. (South Korea) )
  • Kim, D.-J. ( Hynix Semiconductor, Inc. (South Korea) )
  • Koh, C.-W. ( Hynix Semiconductor, Inc. (South Korea) )
  • Park, S.-N. ( Hynix Semiconductor, Inc. (South Korea) )
  • Kwon, W.-T. ( Hynix Semiconductor, Inc. (South Korea) )
Publication title:
Optical Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5040
Pub. date:
2003
Vol.:
Part Two
Page(from):
941
Page(to):
947
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
Language:
English
Call no.:
P63600/5040
Type:
Conference Proceedings

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