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Performance of a high-NA dual-stage 193-nm TWINSCAN Step and Scan system for 80-nm applications

Author(s):
Klerk, J. ( ASML (Netherlands) )
Jorritsma, L. ( ASML (Netherlands) )
Setten, E. ( ASML (Netherlands) )
Droste, R. ( ASML (Netherlands) )
Jongh, R.C. ( ASML (Netherlands) )
Hansen, S.G. ( ASML (Netherlands) )
Smith, D. ( ASML (Netherlands) )
Kerkhof, M.A. ( ASML (Netherlands) )
Mast, F. ( ASML (Netherlands) )
Graeupner, P. ( Carl Zeiss SMT AG (Germany) )
Rohe, T. ( Carl Zeiss SMT AG (Germany) )
Kornitzer, K. ( Carl Zeiss SMT AG (Germany) )
7 more
Publication title:
Optical Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5040
Pub. Year:
2003
Vol.:
Part Two
Page(from):
822
Page(to):
840
Pages:
19
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
Language:
English
Call no.:
P63600/5040
Type:
Conference Proceedings

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