Angle-resolved scattering measurements of polished surfaces and optical coatings at 157 nm

Angle-resolved scattering measurements of polished surfaces and optical coatings at 157 nm

Author(s):

Bloomstein, T.M. ( MIT Lincoln Lab. (USA) )
Hardy, D.E. ( MIT Lincoln Lab. (USA) )
Gomez, L. ( MIT Lincoln Lab. (USA) )
Rothschild, M. ( MIT Lincoln Lab. (USA) )

Publication title:

Optical Microlithography XVI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5040

Pub. Year:

2003

Vol.:

Part Two

Page(from):

742

Page(to):

752

Pages:

11

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448453 [0819448451]

Language:

English

Call no.:

P63600/5040

Type:

Conference Proceedings

Details

TDL ID:	ZA00013030
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2003 : 16th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2003.02.25-2003.02.28

Similar Items:

1 Conference Proceedings Optical materials and coatings at 157 nm Bloomstein,T.M., Liberman,V., Rothschild,M., Hardy,D.E., Goodman,R.B. SPIE - The International Society for Optical Engineering	7 Conference Proceedings UV cleaning of contaminated 157-nm reticles Bloomstein,T.M., Liberman,V., Rothschild,M., Efremow Jr.,N.N., Hardy,D.E., Palmacci,S.T. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Contamination rates of optical surfaces at 157 nm in the presence of hydrocarbon impurities Bloomstein, T.M., Liberman, V., Rothschild, M., Palmacci, S.T., Hardy, D.E., Sedlacek, J.H.C. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Interference lithography at 157 nm Switkes,M., Bloomstein,T.M., Rothschild,M. SPIE - The International Society for Optical Engineering
3 Conference Proceedings Determination of optical properties of thin films and surfaces in 157-nm lithography Liberman,V., Bloomstein,T.M., Rothschild,M. SPIE - The International Society for Optical Engineering	9 Conference Proceedings Controlled contamination of optics under 157-nm laser irradiation Bloomstein,T.M., Liberman,V., Palmacci,S.T., Rothschild,M. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Contamination rates of optical surfaces at 157 nm: impurities outgassed from construction materials and from photoresists Bloomstein, T.M., Sedlacek, J.H.C., Palmacci, S.T., Hardy, D.E., Liberman, V., Rothschild, M. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Outlook for 157-nm resist design Kunz, R. R., Bloomstein, T. M., Hardy, D. E., Goodman, R. B., Downs, D. K., Curtin, J. E. SPIE - The International Society of Optical Engineering
5 Conference Proceedings Laser cleaning of optical elements in 157-nm lithography Bloomstein,T.M., Rothschild,M., Liberman,V., Hardy,D.E., Efremow,N.N.,Jr., Palmacci,S.T. SPIE - The International Society for Optical Engineering	11 Conference Proceedings Photoresist outgassing at 157-nm exposure Hien,S., Angood,S., Ashworth,D., Basset,S., Bloomstein,T.M., Dean,K.R., Kunz,R.R., Miller,D.A., Patel,S., Rich,G.K. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Photo-induced changes in 157-nm optical coatings Liberman, V., Bloomstein, T.M., Rothschild, M., Palmacci, S.T., Sedlacek, J.H.C., Grenville, A. SPIE - The International Society of Optical Engineering	12 Conference Proceedings Measurement of total integrated scatter of optical coatings for 157-nm lithography Saito,T., Saito,J., Nakamura,E., Kudo,T., Kagaya,M., Takahashi,T. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12