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Contamination rates of optical surfaces at 157 nm: impurities outgassed from construction materials and from photoresists

Author(s):
Bloomstein, T.M. ( MIT Lincoln Lab. (USA) )
Sedlacek, J.H.C. ( MIT Lincoln Lab. (USA) )
Palmacci, S.T. ( MIT Lincoln Lab. (USA) )
Hardy, D.E. ( MIT Lincoln Lab. (USA) )
Liberman, V. ( MIT Lincoln Lab. (USA) )
Rothschild, M. ( MIT Lincoln Lab. (USA) )
1 more
Publication title:
Optical Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5040
Pub. Year:
2003
Vol.:
Part One
Page(from):
650
Page(to):
661
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
Language:
English
Call no.:
P63600/5040
Type:
Conference Proceedings

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