Blank Cover Image

Status 157-nm lithography development at IMEC

Author(s):
Ronse, K.G. ( IMEC (Belgium) )
Bisschop, P.D. ( IMEC (Belgium) )
Eliat, A. ( IMEC (Belgium) )
Goethals, A.M. ( IMEC (Belgium) )
Hermans, J. ( IMEC (Belgium) )
Jonckheere, R. ( IMEC (Belgium) )
Heuvel, D.V.D. ( IMEC (Belgium) )
Roey, F.V. ( IMEC (Belgium) )
Beckx, S. ( IMEC (Belgium) )
Wouters, J.M. ( IMEC (Belgium) )
Marneffe, J.F. ( IMEC (Belgium) )
O'Neil, T. ( ASML (USA) )
Tirri, B. ( ASML (USA) )
Sewell, H. ( ASML (USA) )
9 more
Publication title:
Optical Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5040
Pub. Year:
2003
Vol.:
Part One
Page(from):
640
Page(to):
649
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
Language:
English
Call no.:
P63600/5040
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings EUV lithography program at IMEC

A. M. Goethals, R. Jonckheere, G. F. Lorusso, J. Hermans, F. V. Roey, A. Myers, M. Chandhok, I. Kim, A. Niroomand, F. …

SPIE - The International Society of Optical Engineering

Light, S., Stepanenko, N., Gronheid, R., Van Roey, F., Van den Heuvel, D., Goethals, A.-M.

SPIE - The International Society of Optical Engineering

R. Jonckheere, G. F. Lorusso, A. M. Goethals, J. Hermans, B. Baudemprez, A. Myers, I. Kim, A. Niroomand, F. Iwamoto, N. …

SPIE - The International Society of Optical Engineering

Wells, G., Hermans, J., Watso, R., Kang, Y.-S., Morton, R., Kocsis, M.K., Okoroanyanwu, U., De Bisschop, P., Stepanenko, …

SPIE - The International Society of Optical Engineering

G. F. Lorusso, J. Hermans, A. M. Goethals, B. Baudemprez, F. Van Roey

Society of Photo-optical Instrumentation Engineers

Okoroanyanwu, U., Stepanenko, N., Vereecke, G., Eliat, A., Kocsis, M.K., Kang, Y.S., Jonckheere, R.M., Conard, T., …

SPIE - The International Society of Optical Engineering

R. Jonckheere, G. F. Lorusso, A. Goethals, K. Ronse, J. Hermans, R. D. Ruyter

SPIE - The International Society of Optical Engineering

10 Conference Proceedings Full-field imaging with a 157-nm scanner

Robinson, C., Seong, N., Kimmel, K., Brunner, T.A., Hibbs, M., Lercel, M.J., McCafferty, D., Sewell, H., O'Neil, T.K., …

SPIE - The International Society of Optical Engineering

Sewell, H., Tirri, B.A., O'Neil, T., Fahey, T.J., McCafferty, D.C., Reid, P.B., McClay, J.A.

SPIE-The International Society for Optical Engineering

E. Hendrickx, A. M. Goethals, A. Niroomand, R. Jonckheere, F. Van Roey

Society of Photo-optical Instrumentation Engineers

Goethals,A.M., Vertommen,J., Roey,F.Van, Yen,A., Tritchkov,A., Ronse,K., Jonckheere,R., hove,L.Van den

SPIE-The International Society for Optical Engineering

Okoroanyanwu, U., Gronheid, R., Coenen, J., Hermans, J., Ronse, K.G.

SPIE - The International Society of Optical Engineering

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12