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Status 157-nm lithography development at IMEC

Author(s):
Ronse, K.G. ( IMEC (Belgium) )
Bisschop, P.D. ( IMEC (Belgium) )
Eliat, A. ( IMEC (Belgium) )
Goethals, A.M. ( IMEC (Belgium) )
Hermans, J. ( IMEC (Belgium) )
Jonckheere, R. ( IMEC (Belgium) )
Heuvel, D.V.D. ( IMEC (Belgium) )
Roey, F.V. ( IMEC (Belgium) )
Beckx, S. ( IMEC (Belgium) )
Wouters, J.M. ( IMEC (Belgium) )
Marneffe, J.F. ( IMEC (Belgium) )
O'Neil, T. ( ASML (USA) )
Tirri, B. ( ASML (USA) )
Sewell, H. ( ASML (USA) )
9 more
Publication title:
Optical Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5040
Pub. date:
2003
Vol.:
Part One
Page(from):
640
Page(to):
649
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
Language:
English
Call no.:
P63600/5040
Type:
Conference Proceedings

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