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Improvement of shot uniformity on a wafer by controlling backside transmittance distribution of a photomask

Author(s):
Park, J.R. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, S.H. ( Samsung Electronics Co., Ltd. (South Korea) )
Yeo, G.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
Choi, S.-W. ( Samsung Electronics Co., Ltd. (South Korea) )
Ki, W.-T. ( Samsung Electronics Co., Ltd. (South Korea) )
Yoon, H.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
Sohn, J.-M. ( Samsung Electronics Co., Ltd. (South Korea) )
2 more
Publication title:
Optical Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5040
Pub. date:
2003
Vol.:
Part One
Page(from):
553
Page(to):
560
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
Language:
English
Call no.:
P63600/5040
Type:
Conference Proceedings

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