Blank Cover Image

Scatterometer-based scanner fingerprinting technique(ScatterLith) and its applications in image field and ACLV analysis

Author(s):
Wang, C. ( Texas Instruments Inc. (USA) )
Zhang, G. ( Texas Instruments Inc. (USA) )
DeMoor, S.J. ( Texas Instruments Inc. (USA) )
Boehm, M.A. ( Texas Instruments Inc. (USA) )
Littau, M.E. ( Accent Optical Technologies, Inc. (USA) )
Raymond, C.J. ( Accent Optical Technologies, Inc. (USA) )
1 more
Publication title:
Optical Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5040
Pub. Year:
2003
Vol.:
Part One
Page(from):
541
Page(to):
552
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
Language:
English
Call no.:
P63600/5040
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Evaluating scanner lens spherical aberration using scatterometer

Wang, C., Zhang, G., Tan, C.L., Atkinson, C., Boehm, M.A., Brown, J.M., Godfrey, D., Littau, M.E., Raymond, C.J.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Gauge control for sub-170-nm DRAM product features

Lafferty,N., Gould,C.J., Littau,M.E., Raymond,C.J.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Characterization of ACLV for advanced technology nodes using scatterometer-based lens fingerprinting technique

Wang, C.A., Zhang, G., DeMoor, S., Tan, C., Ilzhoefer, J., Atkinson, C., Wickman, C., Hansen, S., Geh, B., Flagello, …

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Asymmetric line profile measurement using angular scatterometry

Raymond,C.J., Littau,M.E., Pitts,T., Nagy,P.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Scatterometry for shallow trench isolation (STI) process metrology

Raymond,C.J., Littau,M.E., Markle,R.J., Purdy,M.A.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Illumination pupil fill measurement and analysis and its application in scanner V-H bias characterization for 130-nm node and beyond

Zhang, G., Wang, C., Tan, C.L., Ilzhoefer, J.R., Atkinson, C., Renwick, S.P., Slonaker, S.D., Godfrey, D., Fruga, C.H.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Comparison of solutions to the scatterometry inverse problem

Raymond, C.J., Littau, M.E., Chuprin, A., Ward, S.

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Diffraction signature analysis methods for improving scatterometry precision [6152-125]

Littau, M., Forman, D., Bruce, J., Raymond, C. J., Hummel, S. G.

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Applications of angular scatterometry for the measurement of multiply periodic features

Raymond, C.J., Littau, M.E., Youn, B.J., Sohn, C.-J., Kim, J.A., Kang, Y.S.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Dome scatterometry for the measurement of advanced geometry semiconductor devices [6152-54]

Raymond, C. J., Littau, M., Forman, D., Hummel, S. G.

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Novel implementations of scatterometry for lithography process control

Littau, M.E., Raymond, C.J., Gould, C.J., Gambill, C.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Effect of grating pitch variation on scatterometry measurements [6152-177]

Forman, D., Littau, M., Raymond, C. J., Hummel, S. G

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12