Process, design and optical proximity correction requirements for the 65nm device generation

Process, design and optical proximity correction requirements for the 65nm device generation

Author(s):

Lucas, K. ( Motorola, Inc. (USA) )

Montgomery, P. ( Motorola, Inc. (USA) )

Litt, L.C. ( Motorola, Inc. (USA) )

Conley, W. ( Motorola, Inc. (USA) )

Postnikov, S.V. ( Motorola, Inc. (USA) )

Wu, W. ( Motorola, Inc. (USA) )

Yuan, C.-M. ( Motorola, Inc. (USA) )

Olivares, M. ( Motorola, Inc. (USA) )

Strozewski, K. ( Motorola, Inc. (USA) )

Carter, R.L. ( Motorola, Inc. (USA) )

Vasek, J. ( Motorola, Inc. (USA) )

Smith, D. ( Motorola, Inc. (USA) )

Fanucchi, E.L. ( Motorola, Inc. (USA) )

Wiaux, V. ( IMEC (Belgium) )

Vandenberghe, G. ( IMEC (Belgium) )

Toublan, O. ( Mentor Graphics Corp. (France) )

Verhappen, A. ( ASML (Netherlands) )

Kuijten, J.P. ( ASML (Netherlands) )

Wingerden, J. ( Philips Research Labs. (Belgium) )

Kasprowicz, B.S. ( Photronics, Inc. (USA) )

Tracy, J.W. ( Photronics, Inc. (USA) )

Progler, C.J. ( Photronics, Inc. (USA) )

Shiro, E. ( Motorola, Inc. (Russia) )

Topouzov, I. ( Motorola, Inc. (Russia) )

Wimmer, K. ( Motorola, Inc. (France) )

Roman, B.J. ( Motorola, Inc. (USA) )

21 more

Publication title:

Optical Microlithography XVI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5040

Pub. Year:

2003

Vol.:

Part One

Page(from):

408

Page(to):

419

Pages:

12

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448453 [0819448451]

Language:

English

Call no.:

P63600/5040

Type:

Conference Proceedings

Details

TDL ID:	ZA00013029
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2003 : 16th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2003.02.25-2003.02.28

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