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Process, design and optical proximity correction requirements for the 65nm device generation

Author(s):
Lucas, K. ( Motorola, Inc. (USA) )
Montgomery, P. ( Motorola, Inc. (USA) )
Litt, L.C. ( Motorola, Inc. (USA) )
Conley, W. ( Motorola, Inc. (USA) )
Postnikov, S.V. ( Motorola, Inc. (USA) )
Wu, W. ( Motorola, Inc. (USA) )
Yuan, C.-M. ( Motorola, Inc. (USA) )
Olivares, M. ( Motorola, Inc. (USA) )
Strozewski, K. ( Motorola, Inc. (USA) )
Carter, R.L. ( Motorola, Inc. (USA) )
Vasek, J. ( Motorola, Inc. (USA) )
Smith, D. ( Motorola, Inc. (USA) )
Fanucchi, E.L. ( Motorola, Inc. (USA) )
Wiaux, V. ( IMEC (Belgium) )
Vandenberghe, G. ( IMEC (Belgium) )
Toublan, O. ( Mentor Graphics Corp. (France) )
Verhappen, A. ( ASML (Netherlands) )
Kuijten, J.P. ( ASML (Netherlands) )
Wingerden, J. ( Philips Research Labs. (Belgium) )
Kasprowicz, B.S. ( Photronics, Inc. (USA) )
Tracy, J.W. ( Photronics, Inc. (USA) )
Progler, C.J. ( Photronics, Inc. (USA) )
Shiro, E. ( Motorola, Inc. (Russia) )
Topouzov, I. ( Motorola, Inc. (Russia) )
Wimmer, K. ( Motorola, Inc. (France) )
Roman, B.J. ( Motorola, Inc. (USA) )
21 more
Publication title:
Optical Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5040
Pub. Year:
2003
Vol.:
Part One
Page(from):
408
Page(to):
419
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
Language:
English
Call no.:
P63600/5040
Type:
Conference Proceedings

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