Application of CPL reticle technology for the 65- and 50-nm node

Application of CPL reticle technology for the 65- and 50-nm node

Author(s):

Conley, W. ( Motorola, Inc. (USA) )

Broeke, D.J.V.D. ( ASML (USA) )

Socha, R.J. ( ASML (USA) )

Wu, W. ( Motorola, Inc. (USA) )

Litt, L.C. ( Motorola, Inc. (USA) )

Lucas, K. ( Motorola, Inc. (USA) )

Nelson-Thomas, C.M. ( Motorola, Inc. (USA) )

Roman, B.J. ( Motorola, Inc. (USA) )

Chen, F. ( ASML (USA) )

Wampler, K.E. ( ASML (USA) )

Laidig, T.L. ( ASML (USA) )

Hsu, S.D. ( ASML (USA) )

Schaefer, E. ( ASML (USA) )

Cassel, S. ( ASML (USA) )

Yu, L. ( ASML (USA) )

Kasprowicz, B.S. ( Photronics Inc. (USA) )

Progler, C.J. ( Photronics Inc. (USA) )

Petersen, J.S. ( Petersen Advanced Lithography, Inc. (USA) )

Gerold, D.J. ( Petersen Advanced Lithography, Inc. (USA) )

Maslow, M.J. ( Petersen Advanced Lithography, Inc. (USA) )

15 more

Publication title:

Optical Microlithography XVI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5040

Pub. Year:

2003

Vol.:

Part One

Page(from):

392

Page(to):

398

Pages:

7

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448453 [0819448451]

Language:

English

Call no.:

P63600/5040

Type:

Conference Proceedings

Details

TDL ID:	ZA00013029
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2003 : 16th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2003.02.25-2003.02.28

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