Vortex via process: analysis and mask fabrication for contact CDs <80 nm
- Author(s):
Levenson, M.D. ( M.D. Levenson Consulting (USA) ) Tan, S.M. ( Univ. of Auckland (New Zealand) ) Dai, G. ( SIGMA-C (USA) ) Morikawa, Y. ( Dai Nippon Printing Co., Ltd. (Japan) ) Hayashi, N. ( Dai Nippon Printing Co., Ltd. (Japan) ) Ebihara, T. ( Canon USA, Inc. (USA) ) - Publication title:
- Optical Microlithography XVI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5040
- Pub. Year:
- 2003
- Vol.:
- Part One
- Page(from):
- 344
- Page(to):
- 370
- Pages:
- 27
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448453 [0819448451]
- Language:
- English
- Call no.:
- P63600/5040
- Type:
- Conference Proceedings
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