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Limits of strong phase-shift patterning for device research

Author(s):
Fritze, M. ( MIT Lincoln Lab. (USA) )
Mallen, R.D. ( MIT Lincoln Lab. (USA) )
Wheeler, B. ( MIT Lincoln Lab. (USA) )
Yost, D. ( MIT Lincoln Lab. (USA) )
Snyder, J.P. ( Spinnaker Semiconductor (USA) )
Kasprowicz, B.S. ( Photronics Inc. (USA) )
Eynon, B.G. ( Photronics Inc. (USA) )
Liu, H.-Y. ( Numerical Technologies, Inc. (USA) )
3 more
Publication title:
Optical Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5040
Pub. Year:
2003
Vol.:
Part One
Page(from):
327
Page(to):
343
Pages:
17
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
Language:
English
Call no.:
P63600/5040
Type:
Conference Proceedings

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