Alternating phase-shift masks for contact patterning

Alternating phase-shift masks for contact patterning

Author(s):

Schenker, R.E. ( Intel Corp. (USA) )
Allen, G.A. ( Intel Corp. (USA) )
Tejnil, E. ( Intel Corp. (USA) )
Ogadhoh, S. ( Intel Corp. (USA) )

Publication title:

Optical Microlithography XVI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5040

Pub. Year:

2003

Vol.:

Part One

Page(from):

294

Page(to):

302

Pages:

9

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448453 [0819448451]

Language:

English

Call no.:

P63600/5040

Type:

Conference Proceedings

Details

TDL ID:	ZA00013029
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2003 : 16th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2003.02.25-2003.02.28

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