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ArF solutions for low-k1 back-end imaging

Author(s):
Wiaux, V. ( IMEC (Belgium) )
Montgomery, P.K. ( Motorola Inc. (USA) )
Vandenberghe, G. ( IMEC (Belgium) )
Monnoyer, P. ( IMEC (Belgium) )
Ronse, K.G. ( IMEC (Belgium) )
Conley, W. ( Motorola, Inc. (USA) )
Litt, L.C. ( Motorola, Inc. (USA) )
Lucas, K. ( Motorola, Inc. (USA) )
Finders, J. ( ASML (Netherlands) )
Socha, R. ( ASML (USA) )
Broeke, D.J.V.D. ( ASML (USA) )
6 more
Publication title:
Optical Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5040
Pub. Year:
2003
Vol.:
Part One
Page(from):
270
Page(to):
281
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
Language:
English
Call no.:
P63600/5040
Type:
Conference Proceedings

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