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157-nm lithography for 65-nm node SRAM-gate

Author(s):
Suganaga, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Irie, S. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Miyoshi, S. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Kim, J.-H. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Watanabe, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Kurose, E. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Furukawa, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Hagiwara, T. ( Semiconductor Leading Edge Technologies, Inc (Japan) )
Ishimaru, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Itani, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
5 more
Publication title:
Optical Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5040
Pub. date:
2003
Vol.:
Part One
Page(from):
261
Page(to):
269
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
Language:
English
Call no.:
P63600/5040
Type:
Conference Proceedings

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