157-nm lithography for 65-nm node SRAM-gate

157-nm lithography for 65-nm node SRAM-gate

Author(s):

Suganaga, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Irie, S. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Miyoshi, S. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Kim, J.-H. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Watanabe, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Kurose, E. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Furukawa, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Hagiwara, T. ( Semiconductor Leading Edge Technologies, Inc (Japan) )

Ishimaru, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Itani, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

5 more

Publication title:

Optical Microlithography XVI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5040

Pub. Year:

2003

Vol.:

Part One

Page(from):

261

Page(to):

269

Pages:

9

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448453 [0819448451]

Language:

English

Call no.:

P63600/5040

Type:

Conference Proceedings

Details

TDL ID:	ZA00013029
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2003 : 16th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2003.02.25-2003.02.28

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